Optical characterization of BCN films deposited at various N-2/Ar gas flow ratios by RF magnetron sputtering

    Authors

    V. O. Todi; B. P. Shantheyanda; R. M. Todi; K. B. Sundaram;K. Coffey

    Comments

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    Abbreviated Journal Title

    Mater. Sci. Eng. B-Adv. Funct. Solid-State Mater.

    Keywords

    Sputtering; BCN; Optical properties; Band gap; CHEMICAL-VAPOR-DEPOSITION; SICBN THIN-FILMS; TRIBOLOGICAL PROPERTIES; DIELECTRIC-CONSTANT; MULTILAYER FILMS; BORON-NITRIDE; COATINGS; GROWTH; Materials Science, Multidisciplinary; Physics, Condensed Matter

    Abstract

    We present the deposition and optical characterization of amorphous thin films of boron carbonitride (BCN). The BCN thin films were deposited in a radio frequency magnetron sputtering system using a B4C target. Films of different compositions were deposited by varying the ratio of argon and nitrogen gas in the sputtering ambient. X-ray photoelectron spectroscopy was used to perform surface characterization of the deposited films and a change in composition with nitrogen flow ratio was observed. The effect of gas flow ratios on the optical properties of the films was also investigated. It was found that the transmittance of the films increases with nitrogen incorporation. The optical band gap of the films ranged from 2.0 eV to 3.1 eV and increased with N-2/Ar gas flow ratio except at the highest ratio. (C) 2011 Elsevier B.V. All rights reserved.

    Journal Title

    Materials Science and Engineering B-Advanced Functional Solid-State Materials

    Volume

    176

    Issue/Number

    12

    Publication Date

    1-1-2011

    Document Type

    Article

    Language

    English

    First Page

    878

    Last Page

    882

    WOS Identifier

    WOS:000293672400003

    ISSN

    0921-5107

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