Authors

S. Doring; J. Szilagyi; S. Richter; F. Zimmermann; M. Richardson; A. Tunnermann;S. Nolte

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Abbreviated Journal Title

Opt. Express

Keywords

ABLATION; METALS; DEPTH; SILICON; Optics

Abstract

A detailed study of the influence of the pulse duration, from the femtosecond to the nanosecond regime, on the evolution of the hole shape and depth during percussion drilling in silicon is presented. Real-time backlight imaging of the hole development is obtained for holes up to 2 mm deep with aspect ratios extending to 25:1. For low pulse energies, the hole-shape and drilling characteristics are similar for femtosecond, picoseconds and nanosecond regimes. At higher pulse energies, ns-pulses exhibit slower average drilling rates but eventually reach greater final depths. The shape of these holes is however dominated by branching and large internal cavities. For ps-pulses, a cylindrical shape is maintained with frequent small bulges on the side-walls. In contrast, fs-pulses cause only a limited number of imperfections on a tapered hole shape.

Journal Title

Optics Express

Volume

20

Issue/Number

24

Publication Date

1-1-2012

Document Type

Article

Language

English

First Page

27147

Last Page

27154

WOS Identifier

WOS:000312452800104

ISSN

1094-4087

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