Title

Surface morphologies of homoepitaxial ZnO thin films on non-miscut ZnO substrates

Authors

Authors

M. Wei; R. C. Boutwell;W. V. Schoenfeld

Comments

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Abbreviated Journal Title

Appl. Surf. Sci.

Keywords

Non-miscut ZnO substrates; Molecular beam epitaxy; Homoepitaxy; Atomic; force microscopy; Surface morphology; PULSED-LASER DEPOSITION; MOLECULAR-BEAM EPITAXY; LOW-TEMPERATURE; PLASMA; POLAR; Chemistry, Physical; Materials Science, Coatings & Films; Physics, ; Applied; Physics, Condensed Matter

Abstract

ZnO thin films were grown on Zn-polar non-miscut ZnO substrates by plasma-assisted molecular beam epitaxy (PAMBE). With an electrostatic ion trap applied to the oxygen plasma source, the etching effect by plasma was significantly reduced. Atomically flat surfaces with one monolayer step height along the [0001] direction were achieved at a low growth temperature of 610 degrees C. Good surface morphology with root mean square (RMS) roughness as small as 0.16 nm was achieved. High oxygen plasma power and low Zn flux were necessary to achieve a step-flow growth mode with a homogeneous surface morphology. It was found that the growth rate and surface RMS roughness decreased with increased growth temperature. (C) 2013 Elsevier B.V. All rights reserved.

Journal Title

Applied Surface Science

Volume

277

Publication Date

1-1-2013

Document Type

Article

Language

English

First Page

263

Last Page

267

WOS Identifier

WOS:000320208500039

ISSN

0169-4332

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