Title
Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)
Abbreviated Journal Title
J. Optoelectron. Adv. Mater.
Keywords
Molecular dynamics simulation; Surface diffusion; Jump rate; Velocity; correlation function; SCANNING TUNNELING MICROSCOPE; FRAMEWORK SOLID ELECTROLYTES; SELF-DIFFUSION; ADATOM DIFFUSION; LATERAL MANIPULATION; EXCHANGE; MECHANISM; LATTICE-VIBRATIONS; METAL-SURFACES; SINGLE ATOMS; FCC METALS; Materials Science, Multidisciplinary; Optics; Physics, Applied
Abstract
The aim of this paper is to study the diffusion of Cu adatom on Ag (110) by using the molecular dynamics simulation in the framework of the embedded atom method (EAM) as model of atomic interaction. Our simulation results predict that several diffusion processes such as simple jump, long jump and exchange mechanism may occur in the same system. The static barrier is calculated for each process by the drag method. The dynamic activation energy calculated from the Arrhenius law is in a good agreement with the static barrier. The presence of double jump is studied using velocity correlation function showing small contributions in diffusion process. Implications of these findings are discussed in more details.
Journal Title
Journal of Optoelectronics and Advanced Materials
Volume
14
Issue/Number
11-12
Publication Date
1-1-2012
Document Type
Article
Language
English
First Page
1059
Last Page
1065
WOS Identifier
ISSN
1454-4164
Recommended Citation
"Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)" (2012). Faculty Bibliography 2010s. 3256.
https://stars.library.ucf.edu/facultybib2010/3256
Comments
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