Numerical study of atomic diffusion processes of copper on silver (110) surface: Cu/Ag (110)

    Authors

    K. Sbiaal; Y. Boughaleb; J. Y. Raty; A. Hajjaji; M. Mazroui;A. Kara

    Comments

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    Abbreviated Journal Title

    J. Optoelectron. Adv. Mater.

    Keywords

    Molecular dynamics simulation; Surface diffusion; Jump rate; Velocity; correlation function; SCANNING TUNNELING MICROSCOPE; FRAMEWORK SOLID ELECTROLYTES; SELF-DIFFUSION; ADATOM DIFFUSION; LATERAL MANIPULATION; EXCHANGE; MECHANISM; LATTICE-VIBRATIONS; METAL-SURFACES; SINGLE ATOMS; FCC METALS; Materials Science, Multidisciplinary; Optics; Physics, Applied

    Abstract

    The aim of this paper is to study the diffusion of Cu adatom on Ag (110) by using the molecular dynamics simulation in the framework of the embedded atom method (EAM) as model of atomic interaction. Our simulation results predict that several diffusion processes such as simple jump, long jump and exchange mechanism may occur in the same system. The static barrier is calculated for each process by the drag method. The dynamic activation energy calculated from the Arrhenius law is in a good agreement with the static barrier. The presence of double jump is studied using velocity correlation function showing small contributions in diffusion process. Implications of these findings are discussed in more details.

    Journal Title

    Journal of Optoelectronics and Advanced Materials

    Volume

    14

    Issue/Number

    11-12

    Publication Date

    1-1-2012

    Document Type

    Article

    Language

    English

    First Page

    1059

    Last Page

    1065

    WOS Identifier

    WOS:000312614800030

    ISSN

    1454-4164

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