Title

Controlled argon beam-induced desulfurization of monolayer molybdenum disulfide

Authors

Authors

Q. Ma; P. M. Odenthal; J. Mann; D. Le; C. S. Wang; Y. M. Zhu; T. Y. Chen; D. Z. Sun; K. Yamaguchi; T. Tran; M. Wurch; J. L. McKinley; J. Wyrick; K. Magnone; T. F. Heinz; T. S. Rahman; R. Kawakami;L. Bartels

Comments

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Abbreviated Journal Title

J. Phys.-Condes. Matter

Keywords

FIELD-EFFECT TRANSISTORS; ATOMIC-SCALE STRUCTURE; AUGMENTED-WAVE METHOD; ACTIVE EDGE SITES; HYDROTREATING CATALYSTS; LARGE-AREA; VALLEY; POLARIZATION; MOS2 NANOCATALYSTS; MOLECULAR-DYNAMICS; MO6S6 NANOWIRES; Physics, Condensed Matter

Abstract

Sputtering of MoS2 films of single-layer thickness by low-energy argon ions selectively reduces the sulfur content of the material without significant depletion of molybdenum. X-ray photoelectron spectroscopy shows little modification of the Mo 3d states during this process, suggesting the absence of significant reorganization or damage to the overall structure of the MoS2 film. Accompanying ab initio molecular dynamics simulations find clusters of sulfur vacancies in the top plane of single-layer MoS2 to be structurally stable. Measurements of the photoluminescence at temperatures between 175 and 300 K show quenching of almost 80% for an similar to 10% decrease in sulfur content.

Journal Title

Journal of Physics-Condensed Matter

Volume

25

Issue/Number

25

Publication Date

1-1-2013

Document Type

Article

Language

English

First Page

5

WOS Identifier

WOS:000320110200001

ISSN

0953-8984

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