Authors

M. Masnavi; J. Szilagyi; H. Parchamy;M. C. Richardson

Comments

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"This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in the linked citation and may be found originally at Applied Physics Letters."

Abbreviated Journal Title

Appl. Phys. Lett.

Keywords

Physics, Applied

Abstract

There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5 x 10(10) W/cm(2), while for Gd and Tb it was similar or equal to 0.9%/2 pi sr for laser intensities of (2-5) x 10(12) W/cm(2).

Journal Title

Applied Physics Letters

Volume

102

Issue/Number

16

Publication Date

1-1-2013

Document Type

Article

Language

English

First Page

3

WOS Identifier

WOS:000318269300110

ISSN

0003-6951

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