Abbreviated Journal Title
Appl. Phys. Lett.
Keywords
Physics, Applied
Abstract
There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5 x 10(10) W/cm(2), while for Gd and Tb it was similar or equal to 0.9%/2 pi sr for laser intensities of (2-5) x 10(12) W/cm(2).
Journal Title
Applied Physics Letters
Volume
102
Issue/Number
16
Publication Date
1-1-2013
Document Type
Article
DOI Link
Language
English
First Page
3
WOS Identifier
ISSN
0003-6951
Recommended Citation
Masnavi, Majid; Szilagyi, John; Parchamy, Homaira; and Richardson, Martin C., "Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm" (2013). Faculty Bibliography 2010s. 4381.
https://stars.library.ucf.edu/facultybib2010/4381
Comments
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"This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in the linked citation and may be found originally at Applied Physics Letters."