Abbreviated Journal Title
Opt. Express
Keywords
DIELECTRICS; BREAKDOWN; ABLATION; DYNAMICS; Optics
Abstract
We report on the experimental results of 300 nm features generated on fused silica using a near-infrared (IR) femtosecond laser pulse initiated by an ultraviolet (UV) pulse. With both pulses at a short (similar to 60 fs) delay, the damage threshold of the UV pulse is only 10% of its normal value. Considerable reduction of UV damage threshold is observed when two pulses are at +/- 1.3 ps delay. The damage feature size of the combined pulses is similar to that of a single UV pulse. A modified rate equation model with the consideration of defect states is used to help explain these results. This concept can be applied to shorter wavelengths, e.g. XUV and X-ray, with the required fluence below their normal threshold.
Journal Title
Optics Express
Volume
21
Issue/Number
20
Publication Date
1-1-2013
Document Type
Article
Language
English
First Page
24185
Last Page
24190
WOS Identifier
ISSN
1094-4087
Recommended Citation
Yu, Xiaoming; Bian, Qiumei; Chang, Zenghu; Corkum, P. B.; and Lei, Shuting, "Femtosecond laser nanomachining initiated by ultraviolet multiphoton ionization" (2013). Faculty Bibliography 2010s. 4907.
https://stars.library.ucf.edu/facultybib2010/4907
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