Investigation and impact of oxygen plasma compositions on cubic ZnMgO grown by Molecular Beam Epitaxy

    Authors

    R. C. Boutwell; M. Wei; M. Baudelet;W. V. Schoenfeld

    Comments

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    Abbreviated Journal Title

    J. Alloy. Compd.

    Keywords

    Oxygen plasma; Cubic ZnMgO; Optical emission spectroscopy; THIN-FILMS; OPTOELECTRONIC APPLICATIONS; ZNO; PARAMETERS; MGO; Chemistry, Physical; Materials Science, Multidisciplinary; Metallurgy &; Metallurgical Engineering

    Abstract

    ZnMgO thin films were grown by Molecular Beam Epitaxy on closely-lattice-matched MgO substrates with a Radio-Frequency (RF) generated oxygen plasma. The impact on the cubic ZnMgO of oxygen flow rate and applied RF power was investigated under a high vacuum condition (1E-6 Torr). Optical Emission Spectroscopy identified active species in the plasma including O, O+, and O-2(+). The emission intensity of these species was compared at oxygen flow rates ranging from 0.5 sccm to 2.5 sccm and applied RF powers from 150 W to 500 W. Plasma composition at operating conditions was determined by correlating changes in optical emission to changes in relative concentration of active species in the plasma. Atomic Force Microscopy and profilometry characterized changes in surface roughness and growth rate of produced films. Independently increasing flow rate and RF power increased growth rate while simultaneously decreasing roughness. Growth rate enhancement of 80% was achieved with an improvement in surface roughness from 7.5 nm to 3.3 nm in a 1 mu m square. Optimal conditions are discussed for ZnMgO thin film epitaxy. (c) 2013 Published by Elsevier B.V.

    Journal Title

    Journal of Alloys and Compounds

    Volume

    584

    Publication Date

    1-1-2014

    Document Type

    Article

    Language

    English

    First Page

    327

    Last Page

    330

    WOS Identifier

    WOS:000327135400052

    ISSN

    0925-8388

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