Abbreviated Journal Title
Appl. Phys. Lett.
Keywords
GE-SB-S; WAVE-GUIDES; STRUCTURAL-PROPERTIES; FABRICATION; GLASSES; FILMS; Physics, Applied
Abstract
A chlorine plasma etching-based method for the fabrication of high-performance chalcogenide-based integrated photonics on silicon substrates is presented. By optimizing the etching conditions, chlorine plasma is employed to produce extremely low-roughness etched sidewalls on waveguides with minimal penalty to propagation loss. Using this fabrication method, microring resonators with record-high intrinsic Q-factors as high as 450 000 and a corresponding propagation loss as low as 0.42 dB/cm are demonstrated in submicron chalcogenide waveguides. Furthermore, the developed chlorine plasma etching process is utilized to demonstrate fiber-to-waveguide grating couplers in chalcogenide photonics with high power coupling efficiency of 37% for transverse-electric polarized modes.
Journal Title
Applied Physics Letters
Volume
106
Issue/Number
11
Publication Date
1-1-2015
Document Type
Article
DOI Link
Language
English
First Page
4
WOS Identifier
ISSN
0003-6951
Recommended Citation
Chiles, Jeff; Malinowski, Marcin; Rao, Ashutosh; Novak, Spencer; Richardson, Kathleen; and Fathpour, Sasan, "Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching" (2015). Faculty Bibliography 2010s. 6468.
https://stars.library.ucf.edu/facultybib2010/6468
Comments
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"This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in the linked citation and may be found originally at Applied Physics Letters."