Title

An Interval-Based Metamodeling Approach to Simulate Material Handling in Semiconductor Wafer Fabs

Authors

Authors

O. G. Batarseh; D. Nazzal;Y. Wang

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

IEEE Trans. Semicond. Manuf.

Keywords

Automated material handling systems (AMHS); interval-based simulation; (IBS); metamodel semiconductor manufacturing; UNCERTAINTY; Engineering, Manufacturing; Engineering, Electrical & Electronic; Physics, Applied; Physics, Condensed Matter

Abstract

In this paper, we propose a new efficient meta-modeling approach as a simulation platform to estimate the performance of automated material handling systems (AMHS) in a much shorter execution time. Our new mechanism is based on imprecise probabilities, in which the simulation model parameters are represented as intervals to incorporate unknown dependency relationships as total uncertainties. The interval-based metamodel provides reasonably accurate and fast estimates of the performance measures of interest. The performance measures from the interval-based simulation are represented as intervals that enclose the traditional real-valued simulation estimates. Using the SEMATECH virtual fab as a test bed, the metamodel of the wafer fab AMHS is implemented in JSim, a java-based discrete-event simulation environment, and the results are compared to the detailed large-scale simulation model to investigate the validity of the proposed approach.

Journal Title

Ieee Transactions on Semiconductor Manufacturing

Volume

23

Issue/Number

4

Publication Date

1-1-2010

Document Type

Article

Language

English

First Page

527

Last Page

537

WOS Identifier

WOS:000283942900005

ISSN

0894-6507

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