An Interval-Based Metamodeling Approach to Simulate Material Handling in Semiconductor Wafer Fabs

    Authors

    O. G. Batarseh; D. Nazzal;Y. Wang

    Comments

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    Abbreviated Journal Title

    IEEE Trans. Semicond. Manuf.

    Keywords

    Automated material handling systems (AMHS); interval-based simulation; (IBS); metamodel semiconductor manufacturing; UNCERTAINTY; Engineering, Manufacturing; Engineering, Electrical & Electronic; Physics, Applied; Physics, Condensed Matter

    Abstract

    In this paper, we propose a new efficient meta-modeling approach as a simulation platform to estimate the performance of automated material handling systems (AMHS) in a much shorter execution time. Our new mechanism is based on imprecise probabilities, in which the simulation model parameters are represented as intervals to incorporate unknown dependency relationships as total uncertainties. The interval-based metamodel provides reasonably accurate and fast estimates of the performance measures of interest. The performance measures from the interval-based simulation are represented as intervals that enclose the traditional real-valued simulation estimates. Using the SEMATECH virtual fab as a test bed, the metamodel of the wafer fab AMHS is implemented in JSim, a java-based discrete-event simulation environment, and the results are compared to the detailed large-scale simulation model to investigate the validity of the proposed approach.

    Journal Title

    Ieee Transactions on Semiconductor Manufacturing

    Volume

    23

    Issue/Number

    4

    Publication Date

    1-1-2010

    Document Type

    Article

    Language

    English

    First Page

    527

    Last Page

    537

    WOS Identifier

    WOS:000283942900005

    ISSN

    0894-6507

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