Title

Droplet and Filament Target Stabilizer for EUV Source Nozzles (NL)

Abstract

An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into the process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.

Document Type

Patent

Patent Number

EP 1 429 187 B1

Application Serial Number

3027812.1

Issue Date

9-29-2010

Current Assignee

Agency: University of Central Florida Foundation, Inc.

Assignee at Issuance

Agency: University of Central Florida Foundation, Inc.

Filing Date

12-3-2003

Assignee at Filing

Agency: University of Central Florida Foundation, Inc.

Filing Type

Foreign Filing Record

Donated

yes

Link to Patent
PDF on Google Patents

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