Abstract
Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.
Document Type
Patent
Patent Number
US 7,718,985
Application Serial Number
11/586,975
Issue Date
5-18-2010
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
College
College of Optics and Photonics
Department
CREOL
Allowance Date
2-24-2010
Filing Date
10-26-2006
Assignee at Filing
UCFRF
Filing Type
Nonprovisional Application Record
Donated
no
Recommended Citation
Richardson, Martin; Bernath, Robert; Brown, Christopher; Duncan, Joshua; and Takenoshita, Kazutosh, "Advanced Droplet and Plasma Targeting System" (2010). UCF Patents. 14.
https://stars.library.ucf.edu/patents/14