Abstract

A laser-plasma EUV radiation source that employs one or more approaches for preventing vaporization of material from a nozzle assembly of the source by electrical discharge from the plasma. The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube. The tube extends beyond all of the conductive surfaces of the nozzle assembly by a suitable distance so that the pressure around the closet conducting portion of the nozzle assembly is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source from the vacuum chamber wall. A third approach includes applying a bias potential to the nozzle assembly to raise the potential of the nozzle assembly to the potential of the arc.

Document Type

Patent

Patent Number

US 6,912,267

Application Serial Number

10/289,086

Issue Date

6-28-2005

Current Assignee

Joint Assignment w/UCFRF

Assignee at Issuance

UCFRF

Allowance Date

3-2-2005

Filing Date

11-6-2002

Assignee at Filing

Agency: TRW Inc.

Filing Type

Nonprovisional Application Record

Donated

yes

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