Abstract
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.
Document Type
Patent
Patent Number
US 6,865,255
Application Serial Number
10/082,658
Issue Date
3-8-2005
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
College
College of Optics and Photonics
Department
CREOL
Allowance Date
10-21-2004
Filing Date
10-19-2001
Assignee at Filing
UCFRF
Filing Type
Nonprovisional Application Record
Donated
no
Recommended Citation
Richardson, Martin, "EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions and nano-size particles in solution" (2005). UCF Patents. 161.
https://stars.library.ucf.edu/patents/161