Abstract
Collector optics for an EUV radiation source for collecting EUV radiation. The collector optics includes an elliptical dish reflector where light generated at a focal point of the reflector and is directed to a collection location. A frustal annual reflector is positioned around an outer edge of the dish reflector to collect more of the EUV radiation that may otherwise be lost. The radiation reflected by the annual reflector is directed to a center axicon reflector positioned between the focal point of the dish reflector and the collection location to redirect the radiation reflected by the annual reflector to be within a predetermined collection angle.
Document Type
Patent
Patent Number
US 7,075,713
Application Serial Number
10/429,413
Issue Date
7-11-2006
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
Allowance Date
4-10-2006
Filing Date
5-5-2003
Assignee at Filing
Agency: Northrop Grumman Corporation
Filing Type
Nonprovisional Application Record
Donated
yes
Recommended Citation
Arenberg, Jonathan, "High Efficiency Collector for Laser Plasma EUV Source." (2006). UCF Patents. 227.
https://stars.library.ucf.edu/patents/227