Title

High Temperature EUV Source Nozzle (EP)

Abstract

A nozzle (46) for a laser-plasma EUV radiation source that provides thermal isolation between the nozzle body (48) and the target material flowing therethrough. A target delivery tube (72) is provided that extends through the nozzle body (48). The delivery tube (72) has an expansion aperture (80) positioned behind an exit collimator (50) of the nozzle body (48). The delivery tube (72) is made of a low thermal conductivity material, such as stainless steel, and is in limited contact with the nozzle body (48) so that heating of the nozzle body (48) from the plasma does not heat the liquid target material being delivered through the delivery tube (72). The expansion aperture (80) has a smaller diameter than the exit collimator (50).

Document Type

Patent

Patent Number

EP 1 255 426 B1

Application Serial Number

02009576.6

Issue Date

11-30-2011

Current Assignee

UCFRF

Assignee at Issuance

UCFRF

Filing Date

4-26-2002

Assignee at Filing

Agency: TRW Inc.

Filing Type

Foreign Filing Record

Donated

yes

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