Title
High Temperature EUV Source Nozzle (EP)
Abstract
A nozzle (46) for a laser-plasma EUV radiation source that provides thermal isolation between the nozzle body (48) and the target material flowing therethrough. A target delivery tube (72) is provided that extends through the nozzle body (48). The delivery tube (72) has an expansion aperture (80) positioned behind an exit collimator (50) of the nozzle body (48). The delivery tube (72) is made of a low thermal conductivity material, such as stainless steel, and is in limited contact with the nozzle body (48) so that heating of the nozzle body (48) from the plasma does not heat the liquid target material being delivered through the delivery tube (72). The expansion aperture (80) has a smaller diameter than the exit collimator (50).
Document Type
Patent
Patent Number
EP 1 255 426 B1
Application Serial Number
02009576.6
Issue Date
11-30-2011
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
Filing Date
4-26-2002
Assignee at Filing
Agency: TRW Inc.
Filing Type
Foreign Filing Record
Donated
yes
Recommended Citation
McGregor, Roy; Orsini, Rocco; and Petach, Michael, "High Temperature EUV Source Nozzle (EP)" (2011). UCF Patents. 242.
https://stars.library.ucf.edu/patents/242