Abstract
An EUV radiation source that includes a nozzle positioned a far enough distance away from a target region so that EUV radiation generated at the target region by a laser beam impinging a target stream emitted from the nozzle is not significantly absorbed by target vapor proximate the nozzle. Also, the EUV radiation does not significantly erode the nozzle and contaminate source optics. In one embodiment, the nozzle is more than 10 cm away from the target region.
Document Type
Patent
Patent Number
US 6,933,515
Application Serial Number
10/606,447
Issue Date
8-23-2005
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
Allowance Date
4-5-2005
Filing Date
6-26-2003
Assignee at Filing
Agency: Northrop Grumman Corporation
Filing Type
Nonprovisional Application Record
Donated
yes
Recommended Citation
Fornaca, Steven; Hartlove, Jeffrey; Martos, Armando; McNaught, Stuart; Michaelian, Mark; and Shields, Henry, "Laser-produced plasma EUV light source with isolated plasma" (2005). UCF Patents. 291.
https://stars.library.ucf.edu/patents/291