Title

Lasers Produced Plasma EUV Light Source with Prepulse Enhancement (Europe)

Abstract

An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20-200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

Document Type

Patent

Patent Number

EP 1 492 394 B1

Application Serial Number

03 026 665.4

Issue Date

1-2-2013

Current Assignee

UCFRF

Assignee at Issuance

UCFRF

Allowance Date

4-20-2012

Filing Date

11-19-2003

Assignee at Filing

Agency: Northrop Grumman Corporation

Filing Type

Foreign Filing Record

Donated

yes

Link to Patent
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