Low Vapor Pressure, Low Debris Solid Target for EUV Production (Europe).


An EUV radiation source that creates a stable solid filament target. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target material to be condensed into liquid prior to the filament target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.

Document Type


Patent Number

EP 1 420 296 B1

Application Serial Number

03 023 112.0

Issue Date


Current Assignee

Agency: University of Central Florida Foundation, Inc.

Assignee at Issuance

Agency: University of Central Florida Foundation, Inc.

Allowance Date


Filing Date


Assignee at Filing

Agency: Northrop Grumman Corporation

Filing Type

Foreign Filing Record