Abstract

Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.

Document Type

Patent

Patent Number

US 6,031,241

Application Serial Number

09/001,696

Issue Date

2-29-2000

Current Assignee

Agency: Extreme Ultraviolet (EUV), LLC

Assignee at Issuance

UCFRF

College

College of Optics and Photonics

Department

CREOL

Allowance Date

10-12-1999

Filing Date

12-31-1997

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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