Abstract

A laser-plasma, EUV radiation source that controls the target droplet delivery rate so that successive target droplets are not affected by the ionization of a preceding target droplet. A source nozzle of the source has an orifice of a predetermined size that allow the droplets to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer. The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser so that buffer droplets are delivered between the target droplets. The buffer droplets act to absorb radiation generated from the ionized target droplet so that the next target droplet is not affected.

Document Type

Patent

Patent Number

US 6,855,943 B2

Application Serial Number

10/157,540

Issue Date

2-15-2005

Current Assignee

Joint Assignment w/UCFRF

Assignee at Issuance

Agency: Northrop Grumman Corporation

Allowance Date

10-4-2004

Filing Date

5-28-2002

Assignee at Filing

Agency: TRW Inc.

Filing Type

Nonprovisional Application Record

Donated

yes

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