Abstract

An EUV radiation source that generates a sheet of a liquid target material that has a width that matches the desired laser spot size for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. The EUV source includes a reservoir containing a pressurized cryogenic liquid target material. such as liquid Xenon. The reservoir also includes an array of closely spaced orifices into a vacuum chamber as separated liquid stream filaments of the target material that define the sheet. The liquid streams freeze to form an array of frozen target filaments. A laser beam is directed to a target area in the vacuum chamber where it irradiates the stream of filaments to create a plasma that emits EUV radiation.

Document Type

Patent

Patent Number

US 6,744,851 B2

Application Serial Number

10/159,765

Issue Date

6-1-2004

Current Assignee

UCFRF

Assignee at Issuance

Agency: Northrop Grumman Corporation

Allowance Date

2-27-2004

Filing Date

5-31-2002

Assignee at Filing

Agency: TRW Inc.

Filing Type

Nonprovisional Application Record

Donated

yes

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