Abstract
This invention relates to an extreme ultraviolet lithography system that utilizes thin film protective coatings to protect a plurality of hardware components, located near a laser-produced light source, from the erosive effects of energetic particles emitted by the laser-produced light source.
Document Type
Patent
Patent Number
US 6,479,830 B1
Application Serial Number
09/704,414
Issue Date
11-12-2002
Current Assignee
Agency: University of Central Florida Foundation, Inc.
Assignee at Issuance
Agency: TRW Inc.
Allowance Date
7-12-2002
Filing Date
11-1-2000
Assignee at Filing
Agency: TRW Inc.
Filing Type
Nonprovisional Application Record
Donated
yes
Recommended Citation
Fornaca, Steven and Talmadge, Samuel, "Low sputter-yield coatings for hardware near laser-produced plasma sources" (2002). UCF Patents. 736.
https://stars.library.ucf.edu/patents/736