Abstract

Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.

Document Type

Patent

Patent Number

US 7,492,867 B1

Application Serial Number

10/982,380

Issue Date

2-17-2009

Current Assignee

UCFRF

Assignee at Issuance

UCFRF

College

College of Optics and Photonics

Department

CREOL

Allowance Date

12-17-2008

Filing Date

11-5-2004

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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