Title
Current-Voltage Characteristics Of Submicrom Gaas Mesfets With Nonuniform Channel Doping Profiles
Abstract
We present a physics-based model for GaAs metal semiconductor field-effect transistors (MESFETs). The present model improves an existing model by allowing the possibility that the electric field near the source region can exceed a critical field, which is likely in an advanced submicrom MESFET operated in the quasi-saturation or saturation region. Furthermore, a realistic and nonuniform channel doping profile was considered in our calculations. Experimental data measured from a low-noise, ion-implanted MESFET are included in support of the model. The effects of different doping profiles and velocity profiles in the channel on the MESFET current-voltage characteristics were also investigated. © 1992.
Publication Date
1-1-1992
Publication Title
Solid State Electronics
Volume
35
Issue
11
Number of Pages
1639-1644
Document Type
Article
Identifier
scopus
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/0038-1101(92)90191-E
Copyright Status
Unknown
Socpus ID
0026955331 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0026955331
STARS Citation
Shih, Ko Ming; Klemer, D. P.; and Liou, J. J., "Current-Voltage Characteristics Of Submicrom Gaas Mesfets With Nonuniform Channel Doping Profiles" (1992). Scopus Export 1990s. 1078.
https://stars.library.ucf.edu/scopus1990/1078