Title

On The Reverse Short-Channel Effects Of Submicrom Mosfets

Abstract

A model for the reverse short-channel effects, based on a nonuniform lateral distribution of channel dopant, is verified with two-dimensional simulation results. The simulated results, in agreements with experimental measurements, reveal that the magnitude of the threshold voltage versus the mask channel length present a maximum value.

Publication Date

1-1-1996

Publication Title

Southcon Conference Record

Number of Pages

345-349

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

0029696317 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0029696317

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