Title

Laser chemical vapor deposition of thin films

Keywords

Damkohler number; Laser chemical vapor deposition; Thin films

Abstract

Laser chemical vapor deposition (LCVD) is a technique to deposit thin films of oxidation, corrosion, and wear resistant materials as well as electronic, optoelectronic, and superconductor materials. The shape and morphology, which affect the properties of such films, depend on the laser parameters and the processing conditions. This paper presents a mathematical model to predict the shape of the deposits. Also, this model allows to select the appropriate process parameters to obtain a good quality film. The Damkohler number is shown to influence the morphology of the firm. Also, an optimum condition is found to exist for depositing thin films by using the LCVD technique. Copyright © 1996 Elsevier Science S.A.

Publication Date

12-1-1996

Publication Title

Materials Science and Engineering B

Volume

41

Issue

3

Number of Pages

368-373

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/S0921-5107(96)01890-9

Socpus ID

0030393313 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0030393313

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