Title

Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

Abstract

We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-α transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP. © 1997 Optical Society of America.

Publication Date

1-1-1997

Publication Title

Optics Letters

Volume

22

Issue

1

Number of Pages

34-36

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/OL.22.000034

Socpus ID

0030836119 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0030836119

This document is currently not available here.

Share

COinS