Title

Mass-limited, debris-free laser-plasma EUV source

Abstract

The development of a laser-plasma EUV line emission source based on frozen water droplet targets which is essentially debris-free and capable of continuous, high-repetition-rate (> 1 kHz) operation is described. Created by modest (< 1 J) laser energies, this plasma produces copious emission at 13 and 11.6 nm, the preferred wavelengths for EUV projection lithography, with negligible target operation costs. © 1998 Elsevier Science B.V.

Publication Date

1-1-1998

Publication Title

Optics Communications

Volume

145

Issue

1-6

Number of Pages

109-112

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/S0030-4018(97)00421-5

Socpus ID

0030622732 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0030622732

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