Title

Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region

Abstract

We have observed intense extreme-ultraviolet emission, within the 10-16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography. © 1998 Optical Society of America.

Publication Date

10-15-1998

Publication Title

Optics Letters

Volume

23

Issue

20

Number of Pages

1609-1611

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/OL.23.001609

Socpus ID

3743122911 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/3743122911

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