Title
Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region
Abstract
We have observed intense extreme-ultraviolet emission, within the 10-16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography. © 1998 Optical Society of America.
Publication Date
10-15-1998
Publication Title
Optics Letters
Volume
23
Issue
20
Number of Pages
1609-1611
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/OL.23.001609
Copyright Status
Unknown
Socpus ID
3743122911 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/3743122911
STARS Citation
Klosner, M. A. and Silfvast, W. T., "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region" (1998). Scopus Export 1990s. 3595.
https://stars.library.ucf.edu/scopus1990/3595