Title

Wavelength Considerations In Soft-X-Ray Projection Lithography

Abstract

A molybdenum/silicon multilayer-coated 1:1 ring-field optic with a numerical aperture of 0.0835 is used to carry out soft-x-ray projection imaging with undulator radiation at 12.9 nm. An ideal optic of this type should be able to image 0.1μm features with a contrast exceeding 90% at this wavelength. The useful resolution of our ring-field optic is experimentally found to be approximately 0.2 p, m, probably because of the presence of substrate figuring errors. © 1993 Optical Society of America.

Publication Date

1-1-1993

Publication Title

Applied Optics

Volume

32

Issue

34

Number of Pages

7072-7078

Document Type

Article

Identifier

scopus

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/AO.32.007072

Socpus ID

0027850135 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0027850135

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