Title

Laser Plasma Sources For Soft X-Ray Projection Lithography

Abstract

Compact laser plasma soft x-ray sources are under serious consideration for projection lithography. Current baseline designs for soft x-ray projection lithography systems place stringent performance and cost requirements on a laser plasma soft x-ray source. The x-ray source must meet specific criteria relating to x-ray fluence in the 13 nm region, the wavelength of preference for projection lithography, to output stability at high (kHz) repetition-rates, to continuous long term operation and to operating costs. Moreover the source must operate in a vacuum enclosure in close proximity to costly x-ray and optical elements which must remain in pristine condition, free from degradation by particulate and plasma emission emanating from the source. We discuss these requirements, and review experiments leading to the optimal design of a laser plasma soft x-ray source.

Publication Date

1-1-1993

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

1848

Number of Pages

483-500

Document Type

Article; Proceedings Paper

Identifier

scopus

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.147392

Socpus ID

0027802734 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0027802734

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