Title
Absorption And Thermal Conductivity Of Oxide Thin Films Measured By Photothermal Displacement And Reflectance Methods
Abstract
Photothermal reflectance and photothermal displacement measurements of optical absorption and thermal conductivity are reported for electron-beam-(EB) deposited and ion-plated (IP) thin films of TiO2, Ta2O5, and ZrO2. Of the particular set of samples investigated, the EB films have higher absorption than the IP films. The absorption of the EB samples decreases over a period of -90 min on irradiations with an Ar-ion laser of 488-nm wavelength. By contrast, the absorption of the IP samples changes insignificantly or not at all. Photothermal displacement area scans of coating surfaces yield lower defect densities for the IP samples compared with the EB samples for all three oxide materials. The feasibility and limitations of photothermal measurements for thin-film optical and thermal characterizations are discussed. © 1993 Optical Society of America.
Publication Date
1-1-1993
Publication Title
Applied Optics
Volume
32
Issue
28
Number of Pages
5660-5665
Document Type
Article
Identifier
scopus
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/AO.32.005660
Copyright Status
Unknown
Socpus ID
0027684776 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0027684776
STARS Citation
Wu, Z. L.; Reichling, M.; and Hu, X. Q., "Absorption And Thermal Conductivity Of Oxide Thin Films Measured By Photothermal Displacement And Reflectance Methods" (1993). Scopus Export 1990s. 705.
https://stars.library.ucf.edu/scopus1990/705