Title
Critical Field Patterns In Optical Fibonacci Multilayers
Abstract
Optical coatings with 13, 34, 55, and 89 quarter-wave layers of high- and low-index dielectric materials arranged in Fibonacci sequences F6, F8, F9, and F10, respectively, were deposited with use of a reactive low-voltage ion plating process. The calculated average transmission (Tave) for ϕ = (1/2 ± 1/4)π follows a power law Tave≈ Nm-δ, where Nmis the number of optical quarter-wave layers in a Fibonacci sequence Fm. The critical exponent δ for these multilayers is compared with a renormalization calculation of the exponent governing the total energy width for an electronic system of Fibonacci layers. Spectral-transmittance measurements of the experimental Fibonacci multilayers show some deviation from the calculated spectral transmittance, which is due primarily to absorption in the short-wavelength range, but these measurements do still indicate that the observed optical field patterns are critical. © 1993 Optical Society of America.
Publication Date
1-1-1993
Publication Title
Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume
10
Issue
10
Number of Pages
2231-2235
Document Type
Article
Identifier
scopus
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/JOSAA.10.002231
Copyright Status
Unknown
Socpus ID
0027684572 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0027684572
STARS Citation
Chow, Lee and Guenther, Karl H., "Critical Field Patterns In Optical Fibonacci Multilayers" (1993). Scopus Export 1990s. 706.
https://stars.library.ucf.edu/scopus1990/706