Title

Some Theoretical Aspects Of Thin-Film Optics And Their Applications

Keywords

Electron-beam evaporation; Ion plating; Optical constants; Thin films; TiO2 thin films

Abstract

Titanium dioxide (TiO2) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO2 films depend strongly on the deposition process and its parameters. A comparative study of TiO2 films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO2 thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO2 only, by employing two different deposition processes, is presented with a practical example. © 1993 Optical Society of America.

Publication Date

1-1-1993

Publication Title

Applied Optics

Volume

32

Issue

28

Number of Pages

5594-5600

Document Type

Article

Identifier

scopus

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/AO.32.005594

Socpus ID

0027682032 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0027682032

This document is currently not available here.

Share

COinS