Title
Characterization Of A Flat-Field Grazing-Incidence Xuv Spectrometer
Abstract
We describe a XUV spectrometer for the study of dense hot microplasmas at wavelengths between ≈50 and ≈300 Å. It uses a commercially fabricated grazing incidence flat-field reflection grating with 1200 grooves per millimeter. The spectral resolution was optimized by imaging the source on a narrow slit with the help of a curved grazing incidence mirror. The instrument was tested with a laser-produced plasma as a source. The limit of the resolving power due to imaging aberrations of the flat-field grating ranges from 1500 at 50 Å to 3600 at 200 Å and has been achieved with a 5-μm slit. We also measured and calculated the grating efficiencies for the first to fifth diffraction order as a function of wavelength. © 1993 IOS Press. All rights reserved.
Publication Date
1-1-1993
Publication Title
Journal of X-Ray Science and Technology
Volume
4
Issue
1
Number of Pages
8-17
Document Type
Article
Identifier
scopus
Personal Identifier
scopus
DOI Link
https://doi.org/10.3233/XST-1993-4102
Copyright Status
Unknown
Socpus ID
0003375848 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0003375848
STARS Citation
Schwanda, W.; Eidmann, K.; and Richardson, M. C., "Characterization Of A Flat-Field Grazing-Incidence Xuv Spectrometer" (1993). Scopus Export 1990s. 840.
https://stars.library.ucf.edu/scopus1990/840