Title

Optimization Of Chemical Bath Deposited Cds Thin Films Using Nitrilotriacetic Acid As A Complexing Agent

Keywords

CdS; Chemical bath deposition; Nitrilotriacetic acid; Thin films

Abstract

We report a design of experiment approach for the optimization of CdS thin films grown by chemical bath deposition using nitrilotriacetic acid (NTA) as a complexing agent. With the help of this approach, we developed a set of experiments that enabled us to maximize the growth rate. In comparison with works reported earlier, a much faster growth rate is achieved. Two different cadmium precursors; CdSO4 and CdCl2 were used in this work. Only NTA was used as a ligand for all films deposited on transparent conducting oxide coated soda lime glass substrates. CdS films deposited on quartz glass using only NTA peeled off, and became patchy. However, with the addition of hydrazine monohydrate, high quality CdS films were obtained on quartz glass. © 2007 Elsevier B.V. All rights reserved.

Publication Date

7-31-2008

Publication Title

Thin Solid Films

Volume

516

Issue

18

Number of Pages

5967-5973

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/j.tsf.2007.10.079

Socpus ID

44449085042 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/44449085042

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