Title
Evaluation Of Rf Electrostatic Discharge (Esd) Protection In 0.18-Μm Cmos Technology
Abstract
Electrostatic discharge (ESD) protection design is challenging for RF integrated circuits (ICs) because of the trade-off between the ESD robustness and parasitic capacitance. ESD protection devices are fabricated using the 0.18-μm RF CMOS process and their RF ESD characteristics are investigated by the transmission line pulsing (TLP) tester. The results suggest that the silicon controlled rectifier (SCR) is superior to the diode and NMOS from the perspective of ESD robustness and parasitic, but the SCR nevertheless possesses a longer turn-on time. © 2008 Elsevier Ltd. All rights reserved.
Publication Date
7-1-2008
Publication Title
Microelectronics Reliability
Volume
48
Issue
7
Number of Pages
995-999
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1016/j.microrel.2008.04.005
Copyright Status
Unknown
Socpus ID
48149115040 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/48149115040
STARS Citation
Du, Xiaoyang; Dong, Shurong; Han, Yan; Liou, Juin J.; and Huo, Mingxu, "Evaluation Of Rf Electrostatic Discharge (Esd) Protection In 0.18-Μm Cmos Technology" (2008). Scopus Export 2000s. 10108.
https://stars.library.ucf.edu/scopus2000/10108