Title
Droplet Laser Plasma Source For Euv Lithography
Abstract
A detailed quantitative study of the water droplet laser plasma source was carried with a 100-Hz laser, that characterizes the radiation efficiency and the long-term operation. Results show that the droplet laser plasma source comes close to satisfying all the near-term needs of extreme ultraviolet lithography (EUVL).
Publication Date
1-1-2000
Publication Title
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
Number of Pages
393-394
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1109/cleo.2000.907165
Copyright Status
Unknown
Socpus ID
0034547024 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0034547024
STARS Citation
Schriever, G.; Richardson, M.; and Turcu, E., "Droplet Laser Plasma Source For Euv Lithography" (2000). Scopus Export 2000s. 1051.
https://stars.library.ucf.edu/scopus2000/1051