Title

Superhydrophobic Polytetrafluoroethylene Thin Films With Hierarchical Roughness Deposited Using A Single Step Vapor Phase Technique

Keywords

Atomic force microscopy; Dual-scale roughness; Polytetrafluoroethylene; Pulsed electron deposition; Superhydrophobicity; Thin films

Abstract

Superhydrophobic polytetrafluoroethylene films with hierarchical surface roughness were deposited using pulse electron deposition technique. We were able to modulate roughness of the deposited films by controlling the beam energy and hence the electron penetration depth. The films deposited at higher beam energy showed contact angle as high as 166°. The scanning electron and atomic force microscope studies revealed clustered growth and two level sub-micron asperities on films deposited at higher energies. Such dual-scale hierarchical roughness and heterogeneities at the water-surface interface was attributed to the observed contact angle and thus its superhydrophobic nature.

Publication Date

6-30-2009

Publication Title

Thin Solid Films

Volume

517

Issue

16

Number of Pages

4555-4559

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/j.tsf.2008.12.048

Socpus ID

67349085471 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/67349085471

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