Title
H-Atom Position As Pattern-Determining Factor In Arenethiol Films
Abstract
The evolution of a low coverage of benzenethiol molecules on Cu(111) during annealing shows the prevalence of S...H hydrogen bonds involving hydrogen atoms in the ortho position. The row and pattern formation of (methylated) anthracenethiols indicates intermolecular interactions in which hydrogen atoms at the terminal position of the aromatic moiety dominate. In combination, this leads to the notion that pattern formation in classes of arenethiol molecules is each governed by optimization of the intermolecular interactions of the hydrogen atom at one particular position on the arene. This may provide a general guiding principle for the design of arenethiol films. © 2009 American Chemical Society.
Publication Date
4-22-2009
Publication Title
Journal of the American Chemical Society
Volume
131
Issue
15
Number of Pages
5540-5545
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1021/ja809417k
Copyright Status
Unknown
Socpus ID
67949112576 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/67949112576
STARS Citation
Kwon, Ki Young; Pawin, Greg; Wong, Kin L.; Peters, Eric; and Kim, Daeho, "H-Atom Position As Pattern-Determining Factor In Arenethiol Films" (2009). Scopus Export 2000s. 11934.
https://stars.library.ucf.edu/scopus2000/11934