Title
Euv Lithography
Abstract
EUV lithography promises to be the next, and maybe the last technology to extend Moore's Law fabrication of computer chips. We review the development, status and challenges this technology faces as it nears implementation. © 2009 OSA.
Publication Date
1-1-2009
Publication Title
Optics InfoBase Conference Papers
Number of Pages
-
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1364/fio.2009.ftus1
Copyright Status
Unknown
Socpus ID
85086615235 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/85086615235
STARS Citation
Richardson, Martin, "Euv Lithography" (2009). Scopus Export 2000s. 12574.
https://stars.library.ucf.edu/scopus2000/12574
COinS