Title

Additive Lithography For Micro And Nano-Photonic Applications

Abstract

An alternative approach to fabricating micro-optics is presented. This approach is compatible with conventional lithographic systems and can be applied to thick and thin photoresists. The advantage of the additive lithographic process lies in the ability to sculpt the photoresist in a single processing step.

Publication Date

12-9-2003

Publication Title

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

Volume

1

Number of Pages

252-253

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

0344034173 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0344034173

This document is currently not available here.

Share

COinS