Title

The Repeller Field Debris Mitigation Approach For Euv Sources

Abstract

We describe studies of the debris produced from a high-repetition-rate laser plasma EUVL source based on the mass-limited target concept. In particular, we are developing mass-limited target designs based on complex targets containing tin. Comprehensive analysis of witness-plate detection techniques can reveal many interesting details of the interaction regime, and the impact of the debris. These techniques include Optical Microscopy, Scanning Electron Microscopy, Atomic Force Microscopy, X-ray Photoelectron Spectroscopy, Auger Electron Spectroscopy, and Auger Electron Microscopy. We also describe developments of the repeller field concept of debris inhibition. This technique uses electrostatic fields to reduce the flux of plasma ions impinging on the EUV collimating optics. Here, the first measurements of debris mitigation of a tin-doped target are described, and comparison with earlier measurements of the impact of repeller fields on ion emission from a mass-limited water-droplet target are made.

Publication Date

10-1-2003

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

5037 II

Number of Pages

792-800

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.504570

Socpus ID

0141612940 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/0141612940

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