Title
Studies Of High-Repetition-Rate Laser Plasma Euv Sources From Droplet Targets
Abstract
The water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is used to model the electron density distribution for comparison to electron density distributions obtained through Abel inversion of plasma interferograms. In addition, flat field EUV spectra are compared to synthetic spectra calculated with the atomic physics code RATION.
Publication Date
1-1-2003
Publication Title
Applied Physics A: Materials Science and Processing
Volume
77
Issue
2
Number of Pages
217-221
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1007/s00339-003-2142-4
Copyright Status
Unknown
Socpus ID
0038346611 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0038346611
STARS Citation
Keyser, C.; Schriever, G.; and Richardson, M., "Studies Of High-Repetition-Rate Laser Plasma Euv Sources From Droplet Targets" (2003). Scopus Export 2000s. 2169.
https://stars.library.ucf.edu/scopus2000/2169