Title
Diffusion-Limited Growth Of Fto-Nanofilm-Coated Tin Fractals
Abstract
Highly porous, geometrical complex fractals of 3 nm thick fluorinated tin oxide (FTO) coated tin have been synthesized during a simple anodization. The dimensionality of fractals is 2.95. Quantitative analysis of the FTO nanofilm shows the fluorine content in the FTO film to be as high as 25 atom %. The mechanism of preferential growth of the tin fractals under the influence of the applied electric field during the anodization was explained using a diffusion-limited aggregation (DLA) model. © 2005 The Electrochemical Society. All rights reserved.
Publication Date
10-7-2005
Publication Title
Electrochemical and Solid-State Letters
Volume
8
Issue
10
Document Type
Article
Personal Identifier
scopus
DOI Link
https://doi.org/10.1149/1.2035693
Copyright Status
Unknown
Socpus ID
25644436451 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/25644436451
STARS Citation
Bera, Debasis; Patil, Swanand; and Scammon, Kirk, "Diffusion-Limited Growth Of Fto-Nanofilm-Coated Tin Fractals" (2005). Scopus Export 2000s. 3658.
https://stars.library.ucf.edu/scopus2000/3658