Title

Smooth Etching Of Silicon Using Tmah And Isopropyl Alcohol For Mems Applications

Keywords

Etching; Isopropyl alcohol; Silicon; TMAH

Abstract

Etching of silicon plays an important role in the field of micromachining. In this study, etching was performed on (1 0 0), (1 1 0) and (1 1 1) silicon using tetramethylammonium hydroxide (TMAH). The roughness of the etched silicon surface was studied as a function of the etching parameters. Etching was carried out at three different temperatures with varying solution concentrations with and without isopropyl alcohol. Emphasis was placed on the roughness of the silicon surface obtained after etching. It was observed that roughness is highly dependent on the solution concentration and temperature. Based on the experimental results and theoretical considerations, the etching mechanism has been explained. © 2004 Elsevier B.V. All rights reserved.

Publication Date

4-1-2005

Publication Title

Microelectronic Engineering

Volume

77

Issue

3-4

Number of Pages

230-241

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1016/j.mee.2004.11.004

Socpus ID

15344349685 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/15344349685

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