Title

Analog Micro-Optics Fabrication By Use Of A Two-Dimensional Binary Phase-Grating Mask

Abstract

The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with π phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated, The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated. © 2005 Optical Society of America.

Publication Date

1-15-2005

Publication Title

Optics Letters

Volume

30

Issue

2

Number of Pages

150-152

Document Type

Article

Personal Identifier

scopus

DOI Link

https://doi.org/10.1364/OL.30.000150

Socpus ID

12844278682 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/12844278682

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