Title

Efficient 13.5 Nm Euv Generation From A Laser Plasma

Abstract

We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication. © 2005 Optical Society of America.

Publication Date

1-1-2005

Publication Title

Optics InfoBase Conference Papers

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

Socpus ID

84899146586 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/84899146586

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