Title

High Reflectivity Intracavity Bragg Mirrors For The Far-Infrared P-Ge Laser

Keywords

Bragg mirror; Far-infrared; p-Germanium; Terahertz

Abstract

Multi-layer mirrors capable of >99.9% reflectivity at ∼100 μm wavelengths were constructed using thin silicon etalons separated by empty gaps. Due to the large difference between the index of refraction of silicon (3.384) and vacuum (1), calculations indicate that only three periods are required to produce 99.9% reflectivity. The mirror was assembled from high purity silicon wafers, with resistivity over 4000 ohm-cm to reduce free carrier absorption. Wafers were double side polished with faces parallel within 10 arc seconds. The multi-layer mirror was demonstrated as a cavity mirror for the far-infrared p-Ge laser.

Publication Date

12-20-2004

Publication Title

Proceedings of SPIE - The International Society for Optical Engineering

Volume

5411

Number of Pages

167-173

Document Type

Article; Proceedings Paper

Personal Identifier

scopus

DOI Link

https://doi.org/10.1117/12.542548

Socpus ID

10044246079 (Scopus)

Source API URL

https://api.elsevier.com/content/abstract/scopus_id/10044246079

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